Asia
China Claims Chipmaking Gear Advance Despite Tightening US Curbs
- China improved the resolution of its home-developed DUV gear
- Country still lags far behind in advanced lithography systems
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China has claimed a breakthrough in the development of homegrown chipmaking equipment, an important step in overcoming US sanctions designed to thwart Beijing’s semiconductor goals.
State-linked organizations are advised to use a new laser-based immersion lithography machine with a resolution of 65 nanometers or better, the Ministry of Industry and Information Technology said in an announcement this month. Though the note doesn’t specify the supplier, the spec marks a significant step up from the previous most-advanced indigenous equipment — developed by Shanghai Micro Electronics Equipment Group Co. — which stood at around 90nm.