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Company Description

Contact Info

Weizmann Science Park

PO Box 266

Rehovot, 7610201

Israel

Phone: 972 73 229 5600

Fax: 972 8 940 7776

Nova Measuring Instruments Ltd. operates as a designer, developer, and producer of optical metrology solutions, such as integrated process control metrology systems, as well as metrology used in the manufacturing process of semiconductors. The company supplies its metrology systems to major semiconductor manufacturers worldwide. Products The company’s products include metrology systems for thin film measurement in chemical mechanical polishing and chemical vapor deposition applications; optical CD and Metal Line Thickness systems for use in post-copper chemical mechanical polishing applications and optical critical dimension systems for lithography and etch applications. Its integrated thickness monitoring system for chemical mechanical polishing process control enables wafer-to-wafer closed loop control. It offers various models of integrated thickness monitoring systems, depending on polisher type and end-user requirements. These metrology systems address a range of metrology requirements of its end-user and process equipment manufacturer customers. Both the company’s integrated and stand-alone systems incorporate patented optical scanning, dynamic auto-focus, pattern recognition for arbitrarily oriented wafers and proprietary algorithms for in-water measuring of two layers simultaneously. Thin Film Process Control The NovaScan 2040 is the second generation of integrated thickness monitoring systems with improved spectral range, responding to the needs of the industry for emerging chemical mechanical polishing applications of thin films and complex layer stacks. The NovaScan 2020Cu has the same basic platform as the NovaScan 2040, with additional hardware and software improvements, enabling the system to answer the requirements of copper chemical mechanical polishing monitoring. The NovaScan 3090Next is the company’s major product. Targeted for 45 nm and 32 nm technology nodes with extendibility down to 20nm, this tool provided improvements in throughput, accuracy, tool to tool matching and spectral range over the older NovaScan 3090. It also improved overall tool reliability. The NovaScan 3090Next is available as integrated metrology and as stand-alone metrology systems for both thin film and Optical CD (scatterometry) applications. The Nova T500 stand-alone product family, targeted at technology nodes ranging from 32nm and smaller than 20nm. The Nova T500 features improved metrology performance, improving both accuracy and tool to tool matching, providing industry leading throughput of 250WPH. The new generation Nova i500 integrated metrology features the same metrology as the Nova T500 for complete stand-alone to integrated metrology compatibility. The Nova i500 features advanced metrology for technology nodes smaller than 20nm and high throughput that meets the standards of next generation polishers. The Nova T600 is the latest addition to the stand-alone product family, targeted at technology nodes of 2x and beyond. The Nova T600 features multi-channel reflectometry configuration that is optimized for sensitivity on small features and critical device parameters, such as measurement of high-aspect-ratio structures. The Nova V2600 enables chipmakers to accelerate the development and improve production yield of multi-chip integrations that rely on TSVs (through silicon vias). The Nova V2600 TSV Metrology system, developed in collaboration with device makers, allows accurate measurement of critical TSV features, such as side-wall angle, bottom diameter, and bottom curvature. This process control solution delivers complete TSV dimensional metrology in a high-throughput production-ready system for the industry’s transition to 3D integration in production. Nova V2600 collects a dark-field reflectometry spectrum that is highly sensitive to variations in TSV internal structures, and has a capability to extend measuring of future TSVs with diameters below 5 microns. NovaMars is an advanced scatterometry modeling and application development software tool enabling complex 2D, 3D and in-die measurements. Combined with the NovaMARS modeling software capabilities, the Nova T600 provides the metrol

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