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Company Description

Contact Info

One Technology Drive

Milpitas, CA 95035

United States

Phone: 408-875-3000

Fax: 408-875-4144

KLA-Tencor Corporation offers process control and yield management solutions for the semiconductor and related nanoelectronics industries. The company’s products are also used in other high technology industries, including the light emitting diode (LED) and data storage industries, as well as general materials research. The company’s products and services are used by the bare wafer, integrated circuit (IC), lithography reticle (reticle or mask) and disk manufacturers worldwide. These customers turn to the company for inline wafer and IC defect monitoring, review and classification; reticle defect inspection and metrology; packaging and interconnect inspection; critical dimension (CD) metrology; pattern overlay metrology; film thickness, surface topography and composition measurements; measurement of in-chamber process conditions, wafer shape and stress metrology; computational lithography tools; and overall yield and fab-wide data management and analysis systems. Products The company is engaged primarily in the design, manufacture and marketing of process control and yield management solutions for the semiconductor and related nanoelectronics industries and provides a portfolio of defect inspection and metrology products, and related service, software and other offerings. The company’s defect inspection and metrology products and related offerings are categorized into the following groups: Chip Manufacturing, Wafer Manufacturing, Reticle Manufacturing, LED and Compound Semiconductor Manufacturing, Data Storage Media/Head Manufacturing, Microelectromechanical Systems (MEMS) Manufacturing, and General Purpose/Lab Applications. Chip Manufacturing The company’s comprehensive portfolio of defect inspection and metrology products, and related service, software and other offerings, helps chip manufacturers manage yield throughout the entire semiconductor fabrication process—from research and development to final volume production. Front-End Defect Inspection The company’s front-end defect inspection tools cover a range of yield applications within the IC manufacturing environment, including research and development; incoming wafer qualification; reticle qualification; and tool, process and line monitoring. Patterned and unpatterned wafer inspectors find particles, pattern defects and electrical issues on the front surface, back surface and edge of the wafer, allowing engineers to detect and monitor critical yield excursions. In 2015, the company introduced the 8920 system, which provides high productivity inspection for a range of applications, including advanced IC front-end lithography and chemical mechanical planarization (CMP) processes, automotive device fabrication and advanced legacy fab process control. In 2014, the company launched front-end defect inspection products that help accelerate yield for next-generation design node devices: 2920 Series, Puma 9850 and Surfscan SP5. The 2920 Series broadband plasma patterned wafer inspection systems are used to discover and monitor defects related to design or process issues, supporting advanced IC development and ramp. The Puma 9850 laser scanning patterned wafer inspection system utilizes a range of operating modes to support yield-relevant defect capture for lithography and etch applications and cost-effective excursion monitoring for film and CMP process modules. The Surfscan SP5 unpatterned wafer inspection system utilizes deep ultra-violet (DUV) optical technologies and high throughput to assess incoming wafer quality, evaluate and qualify processes during research and development and monitor processes during production. In the field of patterned wafer inspection, the company offers 2920 Series, 2910 Series, 2900 Series, 2830 Series, 2820 Series and 2810 Series systems (for broadband plasma defect inspection); Puma 9850 Series, Puma 9650 Series and Puma 9500 Series systems (for laser scanning defect inspection); eS805 Series and eS800 Series systems (for electron-beam defect inspection); 8 Series systems (for high productivity defect inspection); and CIRCL cluster tool (for defect inspection, review and metrology of all wafer surfaces - fron


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Valuation KLAC Industry Range
Price/Earnings 21.1x
Price/Sales 4.2x
Price/Book 25.2x
Price/Cash Flow 20.9x
TEV/Sales 2.4x

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