ASML Holding N.V., through its subsidiaries, engages in developing, producing, marketing, selling, and servicing advanced semiconductor equipment systems, including lithography systems. The company’s principal operations are in the Netherlands, the United States, and Asia. The company operates in 70 locations in 16 countries. Products Systems The company offers the TWINSCAN platform. The company offers TWINSCAN systems, equipped with i-line, KrF and ArF light sources for 300 mm processing wafers for manufacturing environments for which imaging at a small resolution is required. TWINSCAN systems also include immersion lithography systems (TWINSCAN immersion systems). With a TWINSCAN immersion system, wafer measurement, including focus and alignment, is completed in the dry stage, while the imaging process, using water, is completed in the wet stage. The TWINSCAN NXT platform enables next generations of semiconductors through the so-called MPT which requires two or more exposures per layer on a chip, enabling precise imaging patterns and lines by using the company’s TWINSCAN NXT planar wafer stage and grid metrology. In 2015, the company shipped its first seven TWINSCAN NXT:1980 systems to support multiple-patterning performance requirements. The company offers NXE:3300B systems. The NXE:3300B system is the successor of the NXE:3100 system and is the company’s third-generation EUV-system. The company’s PAS 5500 product family consists of wafer steppers and Step & Scan systems equipped with i-line, KrF and ArF light sources for processing wafers up to 200 mm in diameter, and are employed in volume manufacturing to achieve design nodes requiring imaging at a resolution down to 90 nanometer. System Related Products The company develops and sells a range of product options and enhancements designed to increase throughput and improve imaging and overlay to optimize value of ownership over the entire life of its systems. This is complemented by full system upgrade packages which enable the company’s TWINSCAN NXT immersion scanners to be upgraded from one model to another. The company’s computational lithography portfolio comprises both traditional products, as well as solutions. To provide a total solution for scanner control the company offers its own advanced wafer metrology system (YieldStar). This wafer metrology system utilizes the scanner controls to compensate for potential performance drifts in the scanner itself, as well as in other steps of the device manufacturing process, such as mask deterioration, resist coating fingerprints, etching fingerprints, or chemical-mechanical polishing fingerprints. YieldStar uses scatterometry technology for overlay and CD measurements. In 2014, the company introduced the fourth generation YieldStar Metrology system, the T250D, available in both stand-alone and integrated version. The YieldStar 250D contains a source with wavelengths up to 765 nanometer and has sensor improvements whereas the YieldStar 200 series enables precise overlay measurement of thicker stacks with sampling, as well as in-line focus and CD. In 2015, the company shipped the first YieldStar 1250D, a measurement tool, which helps identify any inaccuracies in chips during the production cycle. Distribution The company markets and sells its products through its direct sales force. Its account managers, field engineers and applications, service and technical support specialists are located throughout Asia, the United States, and Europe. Suppliers Carl Zeiss SMT AG is the company’s single supplier of lenses, mirrors, collectors, and other optical components. Competition The company competes primarily with Nikon Corporation and Canon Kabushiki Kaisha. History The company was founded in 1984. It was formerly known as ASM Lithography Holding N.V., and changed its name to ASML Holding N.V. in 2001. The company was incorporated in the Netherlands in 1994.
asml holding nv (ASML:EN Amsterdam)
De Run 6501
Veldhoven, 5504 DR
Phone: 31 40 268 3000
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