ASML Holding N.V., through its subsidiaries, engages in developing, producing, marketing, selling, and servicing advanced semiconductor equipment systems, including lithography systems. The company’s principal operations are in the Netherlands, the United States, and Asia. The company operates in 70 locations in 16 countries. Products The company develops lithography systems and related products for the semiconductor industry. Lithography systems are used to print complex circuit patterns onto wafers. The company’s product development strategy focuses on the development of product families based on a modular and upgradeable design. Systems The company’s older PAS 2500 and PAS 5000 lithography systems, which the company no longer manufacture but continue to refurbish, are used with g-line and i-line light sources for processing wafers up to 150 mm in diameter, and are employed in manufacturing environments and in special applications for which design resolutions of 0.5 microns and above are required. The company’s PAS 5500 product family comprises advanced wafer steppers and Step & Scan systems equipped with i-line, KrF (Krypton Fluoride), and ArF (Argon Fluoride) light sources for processing wafers up to 200 mm in diameter, and are employed in volume manufacturing to achieve design nodes requiring imaging at a resolution down to 90 nanometer (nm). The company offers the TWINSCAN platform, which is the basis for its current and next-generation systems, which are expected to be capable of extending shrink technology down to 38 nm and beyond with Multiple Patterning Technology (MPT) techniques. It offers TWINSCAN systems, equipped with i-line, KrF, and ArF light sources for processing wafers up to 300 mm in diameter for manufacturing environments for which imaging at a resolution down to 38 nm are required. The modular upgradeable design philosophy of the PAS 5500 product family has been further refined and applied in the design TWINSCAN. TWINSCAN systems also include immersion lithography systems (TWINSCAN immersion systems). With a TWINSCAN immersion system, wafer measurement, including focus and alignment, is completed in the ‘dry’ stage, while imaging process, using water applied between the wafer and the lens, is completed in the ‘wet’ stage. The company produces dual-stage design TWINSCAN systems. The company has developed different immersion systems for different customer needs. The TWINSCAN NXT platform enables next generations of semiconductors through the so-called MPT, which requires two or more exposures per layer on a chip, enabling precise imaging patterns and lines by using its TWINSCAN NXT planar wafer stage grid metrology. In 2014, the company ramped its newest immersion system, the NXT:1970Ci and shipped 51 systems, which offer overlay below 2 nm, focus control of approximately 20 nm and throughput of approximately 250 wafers per hour. Approximately 260 NXT:1950i and NXT:1960Bi systems are in use by the company’s customers, which are field-upgradeable to the same performance level as its NXT:1970Ci system. In 2013, the company shipped its first NXE:3300B systems. The NXE:3300B system is the successor of the NXE:3100 system and is the company’s third-generation EUV-system. A NXE:3300B system combines a wavelength of 13.5 nm and an optical system with a NA of 0.33 to provide imaging at a resolution of 22 nm. As of December 31, 2014, a total of seven NXE:3300B EUV systems were in the field. System Related Products The company continuously develops and sells a range of product options and enhancements. Its computational lithography portfolio comprises both traditional products (such as resolution enhancement techniques/optical proximity correction/double patterning technology/source-mask optimization), as well as solutions that directly interface with various calibration controls in its scanner to optimize performance. To provide a total solution for scanner control, the company offers its own advanced wafer metrology system (YieldStar). YieldStar uses scatterometry technology for overlay and critical dimension (CD) measurements. The company ships the third generation YieldStar metrology system, the S200C, which features higher throughput and measurement overlay to support tighter on product wafer overlay and focus control performance of the NXT:19X0 systems. In 2014, the company introduced the fourth generation YieldStar Metrology system, the T250D, available in both stand-alone and integrated version. The YieldStar 250D contains a source with wavelengths up to 765nm and has sensor improvements whereas the YieldStar 200 series enable overlay measurement of thicker stacks with increased sampling, as well as in-line focus and CD. Furthermore, as a consequence of the acquisition of Cymer Inc., the company offers its customers OnPulse contracts by providing on-site support from certified service engineers and continuous real-time light source monitoring. Customers The four major customer sectors to which the company sells its products are integrated device manufacturers and foundries, and NAND-Flash memory and DRAM memory chipmakers. Distribution The company markets and sells its products through its direct sales force. Its account managers, field engineers and applications, service and technical support specialists are located throughout Asia, the United States, and Europe. Suppliers Carl Zeiss SMT AG is the company’s single supplier of lenses, mirrors, collectors, and other optical components. Competition The company competes primarily with Nikon Corporation and Canon Kabushiki Kaisha. History The company was founded in 1984. It was formerly known as ASM Lithography Holding N.V., and changed its name to ASML Holding N.V. in 2001. The company was incorporated in the Netherlands in 1994.
asml holding nv (ASML:EN Amsterdam)
De Run 6501
Veldhoven, 5504 DR
Phone: 31 40 268 3000
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