Electronic Equipment, Instruments and Components
Company Overview of Gigaphoton, Inc.
Gigaphoton, Inc. develops, manufactures, and sells excimer laser products used for lithography tools in the semiconductor manufacturing industry in Japan and internationally. It offers Remote Equipment Data Management that remotely monitors excimer laser units via the Internet. The company was founded in 2000 and is based in Oyama-shi, Japan with an additional office in Hiratsuka-shi, Japan. It has sales and support bases in Japan, North America, Korea, China, Taiwan, Singapore, Europe, and the United States. Gigaphoton Inc. operastes as a subsidiary of Komatsu Ltd.
Founded in 2000
Key Executives for Gigaphoton, Inc.
Chief Executive Officer, President and Director
Chief Technology Officer, Executive Vice President and Director
Executive Officer of Development
Executive officer of Control
Senior Executive Officer and Director
Compensation as of Fiscal Year 2015.
Gigaphoton, Inc. Key Developments
Gigaphoton Introduces New Laser Monitoring Solution REDeeM Cloud™
Jul 8 15
Gigaphoton Inc. has announced the launch of REDeeM Cloud™, a new remote laser monitoring solution for Excimer lasers used in semiconductor manufacturing. REDeeM Cloud™ is a highly scalable and customizable solution based on the latest web technologies--offering an open innovation platform that enables external partners to contribute to its evolution and allow the solution to be tailored to satisfy the specific needs of each user. Utilizing REDeeM™, the predecessor to REDeeM Cloud™, Gigaphoton was able to realize great reductions in downtime, achieving extraordinarily high uptime ratios averaging 99.8 percent. However, as Moore's law continues to progresses and semiconductor manufacturers seek further cost reductions and miniaturizations, the laser is required to offer an even greater contribution towards maximizing process efficiency and performance. To achieve this, a highly flexible application platform for monitoring and analyzing broader and more detailed laser performance data is necessary. With the introduction of REDeeM Cloud™, users will not only be able to monitor general laser analysis data, but it will also be possible to combine the data with a variety of optional features and hardware to customize the displays and analysis content to match each user’s requirements. Based on the latest web application technologies and responsive design, the operation of REDeeM Cloud™ is not limited to a specific device, Operating Systems (OS), or screen size. It can be operated using virtually any standard web browser on PCs, tablets, smartphones and other mobile devices. Furthermore, as part of Gigaphoton's initiative for promoting open innovation and collaborations, external partners and users will in the future be able to leverage REDeeM Cloud™ as a platform for developing their own unique features, extensions, and user interfaces. Gigaphoton plans to begin rolling out REDeeM Cloud™to its customers in July 2015.
Gigaphoton Inc. Ships Newest GT64A4 ArF Excimer Laser Supporting Open Platforms
Feb 17 15
Gigaphoton Inc. announced that it will begin shipment of its newest ArF Excimer laser, GT64A4, in February. An important feature of the GT64A4 is its open platform, capable of supporting many kinds of collaborative development efforts. It allows laser data to be easily shared and utilized by customers and partners in cooperation with Gigaphoton to develop new technologies for reducing operational costs and environmental impact. For example, a joint-development project is already underway to further reduce the gas consumption by another 50%. The GT64A4 is designed to be scalable to facilitate the incorporation of new technologies and features as they become available. Customers can continuously upgrade, which enables the ability to use the laser for many years to come. The GT64A4 is also equipped with many of the features developed under Gigaphoton’s long-standing EcoPhoton program, including environmental and cost-friendly gas/electricity reduction technologies such as eTGM and eGRYCOS, which enables an annual operating cost savings of up to 35% compared to previous models. It is also equipped with a new spectrum control technology capable of achieving incredibly high spectral beam stabilization to within ±5 fm (femtometers) offering huge benefits for critical dimension (CD) stability across wafers.
Gigaphoton, Inc. Achieves 92 W EUV Light Source Output at 4.2% CE
Jun 30 14
Gigaphoton, Inc. announced that it has successfully achieved 92 W EUV light source output at 4.2% conversion efficiency (CE) on its prototype laser-produced plasma (LPP) light sources for EUV lithography scanners. The 92 W output was achieved by irradiating an Sn target (tin droplet) with a solid-state pre-pulse laser and a CO(2) laser after combining and optimizing these lasers. Gigaphoton remains committed to continuing its R&D efforts, targeting 150 W output by the end of 2014 and ultimately up to 250 W output for high-volume manufacturing. The prototype LPP light source that has achieved 92 W output with Gigaphoton's unique technologies allows emission of EUV by radiating ultra-small tin (Sn) droplets of less than 20 m in diameter with the solid-state pre-pulse laser and main pulse CO(2) laser. In addition, a combination of a high-output superconducting magnet and Sn etching allows suppression of Sn debris caused by radiation. To maximize the life of the collector mirror, a high-output superconducting magnet generates a powerful magnetic field to guide unwanted debris caused by thermal expansion of the tin droplets towards the tin catcher.
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