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July 06, 2015 10:44 PM ET

Electronic Equipment, Instruments and Components

Company Overview of Gigaphoton, Inc.

Company Overview

Gigaphoton, Inc. develops, manufactures, and sells excimer laser products used for lithography tools in the semiconductor manufacturing industry in Japan and internationally. It offers Remote Equipment Data Management that remotely monitors excimer laser units via the Internet. The company was founded in 2000 and is based in Oyama-shi, Japan with an additional office in Hiratsuka-shi, Japan. It has sales and support bases in Japan, North America, Korea, China, Taiwan, Singapore, Europe, and the United States. Gigaphoton Inc. operastes as a subsidiary of Komatsu Ltd.

400 Yokokurashinden

Oyama-shi,  323-8558


Founded in 2000


81 2 8528 8410


81 2 8528 8439

Key Executives for Gigaphoton, Inc.

Chief Executive Officer, President and Director
Chief Technology Officer, Executive Vice President and Director
Executive Officer of Development
Executive officer of Control
Senior Executive Officer and Director
Compensation as of Fiscal Year 2015.

Gigaphoton, Inc. Key Developments

Gigaphoton Inc. Ships Newest GT64A4 ArF Excimer Laser Supporting Open Platforms

Gigaphoton Inc. announced that it will begin shipment of its newest ArF Excimer laser, GT64A4, in February. An important feature of the GT64A4 is its open platform, capable of supporting many kinds of collaborative development efforts. It allows laser data to be easily shared and utilized by customers and partners in cooperation with Gigaphoton to develop new technologies for reducing operational costs and environmental impact. For example, a joint-development project is already underway to further reduce the gas consumption by another 50%. The GT64A4 is designed to be scalable to facilitate the incorporation of new technologies and features as they become available. Customers can continuously upgrade, which enables the ability to use the laser for many years to come. The GT64A4 is also equipped with many of the features developed under Gigaphoton’s long-standing EcoPhoton program, including environmental and cost-friendly gas/electricity reduction technologies such as eTGM and eGRYCOS, which enables an annual operating cost savings of up to 35% compared to previous models. It is also equipped with a new spectrum control technology capable of achieving incredibly high spectral beam stabilization to within ±5 fm (femtometers) offering huge benefits for critical dimension (CD) stability across wafers.

Gigaphoton, Inc. Achieves 92 W EUV Light Source Output at 4.2% CE

Gigaphoton, Inc. announced that it has successfully achieved 92 W EUV light source output at 4.2% conversion efficiency (CE) on its prototype laser-produced plasma (LPP) light sources for EUV lithography scanners. The 92 W output was achieved by irradiating an Sn target (tin droplet) with a solid-state pre-pulse laser and a CO(2) laser after combining and optimizing these lasers. Gigaphoton remains committed to continuing its R&D efforts, targeting 150 W output by the end of 2014 and ultimately up to 250 W output for high-volume manufacturing. The prototype LPP light source that has achieved 92 W output with Gigaphoton's unique technologies allows emission of EUV by radiating ultra-small tin (Sn) droplets of less than 20 m in diameter with the solid-state pre-pulse laser and main pulse CO(2) laser. In addition, a combination of a high-output superconducting magnet and Sn etching allows suppression of Sn debris caused by radiation. To maximize the life of the collector mirror, a high-output superconducting magnet generates a powerful magnetic field to guide unwanted debris caused by thermal expansion of the tin droplets towards the tin catcher.

Gigaphoton, Inc. Develops Helium-Free Purge Process for ArF Immersion Lasers

Gigaphoton, Inc. announced that it has succeeded in the development of an innovative purge process, one that does not use the rare gas helium, for its "GT Series" of ArF immersion lasers. Evolving its "Green Innovations" environmental technologies, this innovative helium-free purge process enables significant reduction of helium consumption for lithography tools. On Earth, helium is a rare gas -- 5.2 ppm by volume in the atmosphere. It is mainly mined as a byproduct when natural gas is mined. Helium has been used in various industries, including for medical equipment, linear motor cars, and semiconductors, and is indispensable for modern life. But consumption of helium in manufacturing has been increased dramatically, and it is forecast that helium supply will be depleted in approx. 25 years if consumption continues at the current rate. So, the unstable supply and price rise of helium has become a serious issue today.

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