Semiconductors and Semiconductor Equipment
Company Overview of Cymer, Inc.
Cymer, Inc., together with its subsidiaries, engages in the development, manufacture, and marketing of light sources for the manufacturers of photolithography tools in the semiconductor equipment industry. It designs, manufactures, and sells light sources and installed base products for use in photolithography systems used in the manufacture of semiconductors. The company provides installed base products in support of chipmaker customers, who use company’s light sources in their advanced wafer patterning production processes. It also offers support products for its installed base of light sources to the lithography tool manufacturers, as well as directly to chipmakers, which include semicond...
17075 Thornmint Court
San Diego, CA 92127
Founded in 1986
Key Executives for Cymer, Inc.
Cymer, Inc. does not have any Key Executives recorded.
Cymer, Inc. Key Developments
Cymer Announces Shipment of its First XLR 700ix DUV Light Source and Introduces DynaPulse
Feb 23 15
Cymer announced the shipment of its first XLR(R) 700ix light source. Enabling higher scanner throughput and process stability for 14nm chip manufacturing and beyond, the XLR 700ix provides improvements in bandwidth, wavelength and energy stability to reduce process variability and increase yield through improvements in wafer critical dimension (CD) uniformity; software enhancements to increase light source predictability and availability; and reduction in helium and
power consumption to decrease operating costs. Cymer also introduced DynaPulse(TM) as a product upgrade option for OnPulse(R) customers. DynaPulse enables chipmakers to extend their capital investment and achieve the same performance improvements standard in the XLR 700ix to their ArF immersion installed base. Essentially eliminating bandwidth as a source of variation to improve on-wafer critical dimension (CD) uniformity, the XLR 700ix and DynaPulse utilize the same patented
technology to tightly control bandwidth specifications (300+5fm) and achieve stable on-wafer performance.
Cymer, LLC Announces New XLR 700ix DUV Light Source
Nov 30 14
Cymer, LLC announced its new argon fluoride (ArF) immersion light source, the XLR 700ix. Built on the XLR platform, the 700ix provides improvements in bandwidth, wavelength and energy stability, enabling higher scanner throughput and process stability for advanced 14nm chip manufacturing and beyond. The XLR 700ix provides chipmakers tighter bandwidth control (300+5fm) that essentially eliminates bandwidth as a source of process variation for on-wafer performance. Cymer's patented technology applies high-speed closed loop control on a pulse-by-pulse basis, resulting in extremely stable performance. The XLR 700ix introduces a reduction in helium consumption by 50%, while providing stable performance across all conditions, even at high-duty cycles. Helium is mainly used in the Line Narrowing Module (LNM) as a critical purge gas due to its unique thermal properties to ensure stable optical performance. Additionally, the XLR 700ix reduces power consumption by 15% through the inclusion of the latest, field-proven Master Oscillator (MO) chamber design, enabling chipmakers to decrease operating costs. The XLR 700ix also includes software updates that enhance light source predictability and availability, such as auto chamber conditioning and automated gas optimization, delivering the highest system efficiency to meet demanding manufacturing schedules. Cymer's XLR 700ix will begin shipping in first quarter of 2015.
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