Electronic Equipment, Instruments and Components
Company Overview of Arradiance, Inc.
Arradiance, Inc. develops materials and particle detection and amplification products. It offers GEM-D2 process that generates a SEE film, which is deposited on top of standard hydrogen-reduced lead glass micro channel plates and other electron amplification devices; and GEM-R2, a tunable high resistance film. The company also provides GEM-R2D ALD Process Systems that deposit conformal metal, semiconductor, and insulating films on high aspect ratio structures on various substrates. In addition, it offers low noise micro channel amplifiers. The company provides its products for night vision, thermal and fast neutron detection, alternative energy, catalysis, medical imaging, space sciences, an...
142 North Road
Sudbury, MA 01776
Founded in 2003
Key Executives for Arradiance, Inc.
Founder, Chief Executive Officer, President and Director
Co-Founder, Chief Operating Officer, Senior Vice President of Engineering and Director
Principal Material Scientist
Compensation as of Fiscal Year 2014.
Arradiance, Inc. Key Developments
Arradiance Introduces GEMstar XT-P(TM), the First Benchtop Thermal and Plasma-Enhanced Atomic Layer Deposition System for Research
May 14 14
Arradiance, Inc. announced their new GEMStar XT platform that builds on the successful GEMStar thermal ALD system and for the first time, integrates remote inductively coupled plasma (ICP) into an economical benchtop footprint. GEMStar XT(TM) is a second generation thermal ALD platform, designed for the challenging research environment while remaining true to its heritage as the only benchtop ALD system on the market. The new GEMStar XT(TM) is fully upgradeable (at purchase or at a later time) to plasma ALD and includes features such as: 200degC precursor temperatures, 2 second cycle times, high throughput capability, and many new software safety and usability features. The GEMStar XT(TM) retains the hot-wall reactor and laminar flow showerhead design, ability to batch process multiple 200mm substrates, process with up to 8 precursors, up to 4 of which can be heated and a gas assist line for low vapor pressure precursors. GEMStar XT(TM) maintains its superior performance on high aspect-ratio 3D substrates and nano-powders. GEMStar XT-P incorporates a fully functional, remote ICP plasma enhanced ALD capability which enables a broader range of precursor chemistries and ALD films at lower deposition temperatures. The 13.56 MHz plasma source is very compact and air cooled, operating at up to 300 Watts power with an automated matching network. GEMStar XT-P comes standard with three MFC controlled plasma gas lines and one MFC controlled carrier gas line for uniformly depositing even the most challenging oxides, nitrides and metals.
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