Nikon Announces New Immersion Scanner Delivering World-Class Performance and Productivity for 10 nm Manufacturing and Beyond

  Nikon Announces New Immersion Scanner Delivering World-Class Performance and
  Productivity for 10 nm Manufacturing and Beyond

Business Wire

TOKYO -- February 20, 2014

Nikon Corporation introduces the NSR-S630D ArF immersion scanner, delivering
world-class performance and productivity for 10 nm manufacturing and beyond.
The S630D builds on the advanced Streamlign platform to deliver
ground-breaking solutions to extend 193 nm immersion lithography. Enhancements
to reticle positioning accuracy and air/thermal management provide
unprecedented mix-and-match overlay (MMO) ≤ 2.5 nm in order to satisfy the
most stringent immersion multiple patterning requirements. In addition,
continuous scanner innovations enable ultra-high throughput of 250 wafers per
hour (96 exposure shots/wafer) to optimize fab productivity and

The semiconductor industry is moving to development and high volume
manufacturing of sub-10 nm generation process devices, with the most critical
layers exposed using ArF immersion scanners and incorporating multiple
patterning. In order to reduce costs for chipmakers, exceptional scanner
overlay matching capabilities are vital to ensuring maximum yield and
productivity. The S630D builds upon the well-known Streamlign Platform,
incorporating further developments in overlay and lens technology to deliver
exceptional mix-and-match overlay accuracy, as well as new features enabling
world-class throughput. The NSR-S630D is the most advanced scanner for high
volume immersion applications, and fully satisfies aggressive sub-10 nm
multiple patterning requirements.

With an unstoppable commitment to delivering innovative solutions that enable
next-generation lithography, Nikon continues to introduce new scanners that
satisfy device makers’ increasingly demanding performance and productivity
requirements. “The NSR-S630D leverages proven immersion technology,
incorporating key technological innovations to deliver overlay matching below
2.5 nm and throughput of more than 250 wafers per hour. These are all
essential factors in enabling cost-effective multiple patterning at 10 nm and
beyond for our customers,” stated Hamid Zarringhalam, Executive Vice President
of Nikon Precision Inc.

About Nikon

Since 1980, Nikon Corporation has been revolutionizing lithography with
innovative products and technologies. The company is a worldwide leader in
lithography equipment for the semiconductor manufacturing industry with more
than 8,000 exposure systems installed worldwide. Nikon offers the most
extensive selection of production-class photolithography systems serving the
semiconductor industry. Nikon Precision Inc. provides service, training,
applications and technical support, as well as sales and marketing for Nikon
lithography equipment in North America. For more information about Nikon,
access our website at


Nikon Precision Inc.
Holly Magoon, 802-879-5027
Marketing Manager
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