Axcelis Announces Multiple Wins for 'Purion XE' High Energy System Including New Foundry Penetration

 Axcelis Announces Multiple Wins for 'Purion XE' High Energy System Including
                           New Foundry Penetration

Innovative Platform Delivers Industry Leading Purity, Precision and
Productivity to Meet Future Process Challenges as Well as Today's Production

PR Newswire

BEVERLY, Mass., Jan. 9, 2014

BEVERLY, Mass., Jan. 9, 2014 /PRNewswire/ --Axcelis Technologies, Inc.
(Nasdaq: ACLS), a leading supplier of enabling ion implantation solutions for
the semiconductor industry, announced multiple wins for the Company's Purion
XE single wafer, high energy implanter from two leading chipmakers located in
the Asia Pacific region. The wins include the penetration of a new foundry
process dedicated to advanced image sensor devices, as well as a follow on
order from a new fab focused on advanced NAND devices.


Mary Puma, chairman and CEO, said, "We are very excited about these recent
high energy sales, allowing us to further extend our leadership position in
this application space. These purchases were driven by customer requirements
for superior metals and particulate contamination control, while meeting
aggressive goals for productivity and process extendibility. The Purion XE
exceeded expectations on both of these metrics, making it the high energy
implanter of choice."

The Purion XE, featuring Axcelis' industry leading LINAC technology, is the
most advanced high energy system available today. The system leverages the
powerful Purion platform to provide chipmakers with absolute process precision
and purity while delivering remarkable levels of productivity and capital

The Purion Platform
The Purion platform is redefining implanter technology and performance, with
each product setting a new benchmark in its respective market. The powerful
common platform enables the efficient production of all existing and emerging
implant applications across the medium current, high current and high energy
space. The scanned spot beam architecture used on all Purion products assures
that customers can take full advantage of all current and future advanced
process enabling implants, including materials modification techniques
required in leading edge device processes. All Purion implanters incorporate
Axcelis' industry leading contamination defense system for unsurpassed implant
quality, so even the most sensitive devices can realize optimized device
performance. The common platform's proprietary dose and angle control system
and constant focal length scanning deliver the most precise and repeatable
dopant placement available today. The Purion platform includes the Purion M™
medium current implanter, the Purion H™ high current implanter, and the Purion
XE™ high energy implanter.

About Axcelis:
Axcelis (Nasdaq: ACLS), headquartered in Beverly, Mass., has been providing
innovative, high-productivity solutions for the semiconductor industry for
over 35 years. Axcelis is dedicated to developing enabling process
applications through the design, manufacture and complete life cycle support
of ion implantation systems, one of the most critical and enabling steps in
the IC manufacturing process. Learn more about Axcelis at


Maureen Hart (editorial/media) 978.787.4266
Doug Lawson (investor relations) 978.787.9552

SOURCE Axcelis Technologies, Inc.

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