Market Snapshot
  • U.S.
  • Europe
  • Asia
Ticker Volume Price Price Delta
DJIA 16,408.54 -16.31 -0.10%
S&P 500 1,864.85 2.54 0.14%
NASDAQ 4,095.52 9.29 0.23%
Ticker Volume Price Price Delta
STOXX 50 3,155.81 16.55 0.53%
FTSE 100 6,625.25 41.08 0.62%
DAX 9,409.71 91.89 0.99%
Ticker Volume Price Price Delta
NIKKEI 14,516.27 98.74 0.68%
TOPIX 1,173.37 6.78 0.58%
HANG SENG 22,760.24 64.23 0.28%

Mattson Introduces a New Etch System Addressing the Demands of Advanced Semiconductor Technologies and Increasing Its Market


Mattson Introduces a New Etch System Addressing the Demands of Advanced Semiconductor Technologies and Increasing Its Market Presence in Etch

FREMONT, CA -- (Marketwired) -- 12/04/13 -- Mattson Technology, Inc. (NASDAQ: MTSN), a leading supplier of advanced process equipment used to manufacture semiconductors, today introduced its paradigmE XP, next-generation etch system. The latest addition to Mattson Technology's etch product family builds upon the success of the production-proven paradigmE, extending its etch technology and enabling chipmakers to address processing challenges for leading-edge, three-dimensional semiconductor manufacturing. The system has already been qualified by a major semiconductor manufacturer, establishing a strong market position for Mattson etch products in the growing NAND memory market. Additional orders for the paradigmE XP will be shipped over the next two quarters to support production ramps of advanced NAND devices.

The paradigmE XP features a unique technological advance in inductively coupled plasma systems. In a dual-wafer vacuum chamber, Mattson's proprietary dual-zone RF source design provides leading-edge process capability rivaling that of single-wafer vacuum chamber tools. This innovative plasma source provides radially controllable etch uniformity and a wide process window. Built upon Mattson Technology's production-proven high productivity platform, the paradigmE XP's chamber design features patented wafer area isolation, to provide wafer-to-wafer matching results meeting those of single-wafer vacuum chamber tools. The paradigmE XP also features true dual-zone gas distribution further controlling process uniformity performance across the wafer surface. The system offers a process portfolio focused on semi-critical applications for next generation, three-dimensional semiconductor technologies at memory and foundry / logic manufacturers.

"The paradigmE XP not only offers next-generation capability, with excellent process performance, but it also provides proven production worthiness built on our established high-throughput platform," said Rene George, vice president and general manager of Mattson Technology's Plasma Products Group. "This latest addition to our etch product family is expected to expand our presence in the etch market and contribute to Mattson's continued growth through the current business cycle. We are excited to continue innovating true value solutions that deliver the advanced technology and low cost-of-ownership our customers require to maintain competitiveness as they ramp production of next-generation integrated circuits."

About Mattson Technology, Inc. Mattson Technology, Inc. designs, manufactures and markets semiconductor wafer processing equipment used in the fabrication of integrated circuits. We are a leading supplier of plasma and rapid thermal processing equipment to the global semiconductor industry, and operate in three primary product sectors: Dry Strip, Etch, Rapid Thermal Processing and Millisecond Anneal. Through manufacturing and design innovation, we have produced technologically advanced systems that provide productive and cost-effective solutions for customers fabricating current- and next-generation semiconductor devices. For more information, please contact Mattson Technology, Inc., 47131 Bayside Parkway, Fremont, CA, 94538. Telephone: (800) MATTSON / (510) 657-5900. Internet: www.mattson.com.

"Safe Harbor" Statement Under the Private Securities Litigation Reform Act of 1995: This news release contains forward-looking statements. All statements other than statements of historical fact are statements that could be deemed forward-looking statements, including but not limited to statements regarding the company's performance and ability to convert new market opportunities, plans, strategies and objectives of management for future operations. Forward-looking statements address matters that are subject to a number of risks and uncertainties that can cause actual results to differ materially from those expressed or implied by such forward-looking statements and assumptions. Such risks and uncertainties include, but are not limited to: macroeconomic and geopolitical trends and events; end-user demand for semiconductors; customer demand for semiconductor manufacturing equipment; the timing of significant customer orders for the Company's products; customer acceptance of delivered products and the Company's ability to collect amounts due upon shipment and upon acceptance; the Company's ability to timely manufacture, deliver and support ordered products; the Company's ability to bring new products to market and to gain market share with such products; customer rate of adoption of new technologies; risks inherent in the development of complex technology; the timing and competitiveness of new product releases by the Company's competitors; the Company's ability to align its cost structure with market conditions; and other risks and uncertainties described in the Company's Forms 10-K, 10-Q and other filings with the Securities and Exchange Commission. The Company assumes no obligation to update the information provided in this news release.

Mattson Technology Investor Contact J. Michael Dodson tel +1-510-657-5900 fax +1-510-492-5963

Sponsored Links
Advertisement
Advertisements
Sponsored Links
Advertisement