Mattson Introduces a New Etch System Addressing the Demands of Advanced Semiconductor Technologies and Increasing Its Market

Mattson Introduces a New Etch System Addressing the Demands of Advanced 
Semiconductor Technologies and Increasing Its Market
Presence in Etch 
FREMONT, CA -- (Marketwired) -- 12/04/13 --   Mattson Technology,
Inc. (NASDAQ: MTSN), a leading supplier of advanced process equipment
used to manufacture semiconductors, today introduced its paradigmE
XP, next-generation etch system. The latest addition to Mattson
Technology's etch product family builds upon the success of the
production-proven paradigmE, extending its etch technology and
enabling chipmakers to address processing challenges for
leading-edge, three-dimensional semiconductor manufacturing. The
system has already been qualified by a major semiconductor
manufacturer, establishing a strong market position for Mattson etch
products in the growing NAND memory market. Additional orders for the
paradigmE XP will be shipped over the next two quarters to support
production ramps of advanced NAND devices. 
The paradigmE XP features a unique technological advance in
inductively coupled plasma systems. In a dual-wafer vacuum chamber,
Mattson's proprietary dual-zone RF source design provides
leading-edge process capability rivaling that of single-wafer vacuum
chamber tools. This innovative plasma source provides radially
controllable etch uniformity and a wide process window. Built upon
Mattson Technology's production-proven high productivity platform,
the paradigmE XP's chamber design features patented wafer area
isolation, to provide wafer-to-wafer matching results meeting those
of single-wafer vacuum chamber tools. The paradigmE XP also features
true dual-zone gas distribution further controlling process
uniformity performance across the wafer surface. The system offers a
process portfolio focused on semi-critical applications for next
generation, three-dimensional semiconductor technologies at memory
and foundry / logic manufacturers. 
"The paradigmE XP not only offers next-generation capability, with
excellent process performance, but it also provides proven production
worthiness built on our established high-throughput platform," said
Rene George, vice president and general manager of Mattson
Technology's Plasma Products Group. "This latest addition to our etch
product family is expected to expand our presence in the etch market
and contribute to Mattson's continued growth through the current
business cycle. We are excited to continue innovating true value
solutions that deliver the advanced technology and low
cost-of-ownership our customers require to maintain competitiveness
as they ramp production of next-generation integrated circuits." 
About Mattson Technology, Inc.
 Mattson Technology, Inc. designs,
manufactures and markets semiconductor wafer processing equipment
used in the fabrication of integrated circuits. We are a leading
supplier of plasma and rapid thermal processing equipment to the
global semiconductor industry, and operate in three primary product
sectors: Dry Strip, Etch, Rapid Thermal Processing and Millisecond
Anneal. Through manufacturing and design innovation, we have produced
technologically advanced systems that provide productive and
cost-effective solutions for customers fabricating current- and
next-generation semiconductor devices. For more information, please
contact Mattson Technology, Inc., 47131 Bayside Parkway, Fremont, CA,
94538. Telephone: (800) MATTSON / (510) 657-5900. Internet:
www.mattson.com. 
"Safe Harbor" Statement Under the Private Securities Litigation
Reform Act of 1995: This news release contains forward-looking
statements. All statements other than statements of historical fact
are statements that could be deemed forward-looking statements,
including but not limited to statements regarding the company's
performance and ability to convert new market opportunities, plans,
strategies and objectives of management for future operations.
Forward-looking statements address matters that are subject to a
number of risks and uncertainties that can cause actual results to
differ materially from those expressed or implied by such
forward-looking statements and assumptions. Such risks and
uncertainties include, but are not limited to: macroeconomic and
geopolitical trends and events; end-user demand for semiconductors;
customer demand for semiconductor manufacturing equipment; the timing
of significant customer orders for the Company's products; customer
acceptance of delivered products and the Company's ability to collect
amounts due upon shipment and upon acceptance; the Company's ability
to timely manufacture, deliver and support ordered products; the
Company's ability to bring new products to market and to gain market
share with such products; customer rate of adoption of new
technologies; risks inherent in the development of complex
technology; the timing and competitiveness of new product releases by
the Company's competitors; the Company's ability to align its cost
structure with market conditions; and other risks and uncertainties
described in the Company's Forms 10-K, 10-Q and other filings with
the Securities and Exchange Commission. The Company assumes no
obligation to update the information provided in this news release. 
Mattson Technology Investor Contact
J. Michael Dodson
tel +1-510-657-5900
fax +1-510-492-5963 
 
 
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