IMS Nanofabrication Announces Partnership with JEOL for the Realization of Alpha and Beta Electron Multi-Beam Mask Writer (MBMW)

  IMS Nanofabrication Announces Partnership with JEOL for the Realization of
  Alpha and Beta Electron Multi-Beam Mask Writer (MBMW) Tools

Business Wire

VIENNA -- September 3, 2013

IMS Nanofabrication AG (IMS) (www.ims.co.at) announced today that a
partnership was formed with JEOL Ltd. (www.jeol.co.jp/en/) for the realization
of Alpha and Beta electron multi-beam mask writer (MBMW) tools for the 10nm
half-pitch mask technology node. For this purpose IMS Nanofabrication has
developed and demonstrated a multi-beam write engine providing 262-thousand
programmable beams of 50keV energy. JEOL provides a novel platform with an
air-bearing vacuum stage for writing most advanced patterns on 6-inch mask
blanks. The MBMW Alpha tool will be realized in 2014, and will form the basis
for two consecutive MBMW Beta tools which will be built for the MBMW
Collaboration formed by IMS with DNP, Intel, Photronics and TSMC.

“We are very pleased with this partnership, as it will ensure timely
completion of the Alpha and Beta tools, paving the way towards the production
of HVM tools”, said Elmar Platzgummer, CEO of IMS Nanofabrication.

“This partnership reinforces JEOL’s position in the leading-edge mask writer
market with a highly competitive technology. JEOL is proud to contribute a
newly developed multi-generational platform with an air-bearing stage as a
vital part of the tool”, said Yasutoshi Nakagawa, Corporate Officer, General
Manager of SE Business Unit, JEOL Ltd.

***

About IMS

IMS Nanofabrication AG (“IMS”) is an Austrian based high-tech company that was
founded in December 2006 through the merger of the former IMS Nanofabrication
GmbH and IMS - Ionen Mikrofabrikations Systeme GmbH. Based on its extensive
know-how in charged particle systems, IMS offers solutions to directly
transfer custom designed patterns to resist or to generate resist-less two and
three dimensional surface modifications with features below 20 nanometers. IMS
focuses its efforts on the development and production of key tool components
for mask writing and direct write lithography applications. It plans to
commercialize its technology and related services in cooperation with
strategic investors and partners involved in the mask and lithography
ecosystem. For more information on IMS Nanofabrication AG, visit:
www.ims.co.at

About JEOL

JEOL Ltd. is a world leader in electron optical equipment and instrumentation
for high-end scientific and industrial research and development. Core product
groups include electron microscope s (SEMs and TEMs), instruments for the
semiconductor industry (electron beam lithography and a series of defect
review and inspection tools), and analytical instruments including mass
spectrometers, NMRs and ESRs. For more information on JEOL Ltd., visit:
www.jeol.co.jp/en/

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Contact:

IMS Nanofabrication AG
Dr. Hans Loeschner
VP Technical Marketing
phone: +43 1 2144894 24
mobile: +43 699 123 67 223
e-mail: Hans.Loeschner@ims.co.at
JEOL Ltd.
Hirokazu Yamada
Semiconductor Equipment Sales Dept.
phone: +81-42-528-3491
fax: +81-42-528-3488
e-mail: hiyamada@jeol.co.jp
 
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