Nikon to Provide 450 mm Immersion Scanner and Patterning Services for Global
450 mm Consortium
BELMONT, Calif. -- July 8, 2013
Nikon Corporation announced a newly established partnership agreement with the
Research Foundation for the State University of New York (SUNY). Through this
program, Nikon will join the Global 450 mm Consortium (G450C) headquartered at
the SUNY College of Nanoscale Science and Engineering (CNSE).
As part of this partnership with G450C, Nikon will provide its
industry-leading 450 mm ArF immersion scanner to the Albany NanoTech Complex.
In addition, Nikon will supply engineering staff and wafer patterning services
to support and accelerate the development of 450 mm wafer technology.
Scheduled for delivery in April 2015, this 450 mm wafer ArF immersion
lithography system will be used by G450C member companies for process
development, characterization and demonstrations. Nikon aims for
standardization of 450 mm wafer ArF immersion lithography systems by offering
early opportunities to develop 450 mm processes.
Announced by New York Governor Andrew M. Cuomo in September of 2011, the G450C
is a joint program that includes representatives from Intel, IBM,
GLOBALFOUNDRIES, TSMC and Samsung─five of the key worldwide companies working
to create the next generation of computer chip technologies. Located in the
Albany NanoTech Complex at CNSE, the G450C is working to make the industry
transition from 300 mm to 450 mm wafer production as smooth and efficient as
possible. The consortium will leverage industry and government investments, as
well as the state-of-the-art infrastructure at CNSE to demonstrate and deploy
450 mm wafer equipment and processing capabilities. This program has
significant potential benefits to the global nanoelectronics industry. “Nikon
is honored to become an Associate Member of the G450C, which leads the
worldwide industry transition to 450 mm,” said Kazuo Ushida, Nikon Corporation
Executive Vice President and Precision Equipment Company President.
The G450C contract follows recent orders that Nikon has received from a major
device manufacturer for 450 mm ArF immersion lithography systems. Ushida said,
“These latest orders and this partnership with G450C validate the industry’s
approval and confidence in the comprehensive Nikon 450 mm development program.
Nikon also anticipates increased orders from other device manufacturers in
time for shipments of high volume manufacturing systems scheduled in 2017.”
Since 1980, Nikon Corporation has been revolutionizing lithography with
innovative products and technologies. The company is a worldwide leader in
lithography equipment for the microelectronics manufacturing industry with
more than 9,000 exposure systems installed worldwide. Nikon offers the most
extensive selection of production-class steppers and scanners in the industry.
These products serve the semiconductor, flat panel display (LCD/OLED) and
thin-film magnetic head (TFH) industries. Nikon Precision Inc. provides
service, training, applications and technical support, as well as sales and
marketing for Nikon lithography equipment in North America. For more
information about Nikon, access our website athttp://www.nikonprecision.com.
This press release contains forward-looking statements as that term is defined
in the Private Securities Reform Act of 1995, which are subject to known and
unknown risks and uncertainties that could cause actual results to differ
materially from those expressed or implied by such statements. Such statements
are subject to risks, uncertainties and changes in condition, particularly
those related to industry requirements and other risks. The Company undertakes
no obligation to update the information in this press release.
Nikon Precision Inc.
Holly Magoon, 802-879-5027
Senior Marketing Manager
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