Axcelis Ships Next Generation 'Purion M' Medium Current Implanter To Leading
Foundry For Advanced Logic Device Manufacturing
System Delivers Industry Leading Purity, Precision and Productivity for the
Sub 2Xnm Era
BEVERLY, Mass., May 29, 2013
BEVERLY, Mass., May 29, 2013 /PRNewswire/ -- Axcelis Technologies, Inc.
(Nasdaq: ACLS), a leading supplier of enabling ion implantation solutions for
the semiconductor industry, announced today that it has shipped the Company's
new Purion M^™ medium current implanter to one of the world's leading
foundries. This is the third evaluation system to ship since the product was
launched. The system will be used to design and manufacture next generation
logic devices for the sub 2Xnm node.
The Purion M
The new Purion M medium current system utilizes Axcelis' advanced spot beam
line technology coupled with the Purion 500 WPH single wafer platform. This
combination provides chip manufacturers with exceptional reliability, and
remarkable precision and productivity for the widest range of implant energies
and doses to address applications that include the formation of precise wells,
channels and source/drain junctions. In addition, the system's
industry-leading energy range and beam currents enable it to be utilized for
implant processes traditionally run on high energy or high current implanters,
providing chipmakers with maximum manufacturing versatility and capital
efficiency. The Purion M's beam line design utilizes Axcelis' patented angular
energy filter and angle control system, eliminating all forms of energy
contamination while ensuring the industry's most accurate dopant placement.
The result is an exceptionally pure and precise implant, enabling the highest
production yields. The system is part of the Company's expanding line of next
generation Purion implanters, enabling high yield manufacturing of sub 16nm
planar and 3-D devices. The Purion platform was designed to drive
manufacturing flexibility and lower the total cost of fab operations, and
features common end station architecture and spot beamline design, the
industry's most advanced filtration systems, and innovative angle control and
constant focal length scanning systems. The result is absolute beam purity and
the most precise dopant placement possible, while ensuring the highest levels
of productivity and capital efficiency.
Axcelis (Nasdaq: ACLS), headquartered in Beverly, Mass., has been providing
innovative, high-productivity solutions for the semiconductor industry for
over 35 years. Axcelis is dedicated to developing enabling process
applications through the design, manufacture and complete life cycle support
of ion implantation systems, one of the most critical and enabling steps in
the IC manufacturing process. The Company's Internet address is:
Maureen Hart (editorial/media) 978.787.4266
Jay Zager (financial community) 978.787.9408
SOURCE Axcelis Technologies, Inc.
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