USHIO to Consolidate EUV Business into a Single Unit in Japan and Continue Its Business for Inspection and Development Applications - Transferring its maintenance business to ASML - Business Wire TOKYO -- May 9, 2013 USHIO INC. (Headquarters: Tokyo, Japan; President and Chief Executive Officer: Shiro Sugata; hereinafter "USHIO") (TOKYO:6925) today announced that it will close down the activities of XTREME technologies GmbH (Headquarters: Germany; President: Tatsushi Igarashi, hereinafter "XTREME"), a research and development company for Extreme Ultraviolet (EUV) light sources for next-generation semiconductor lithography, and consolidate the EUV light source business into a single unit in Japan and continue it for inspection and development applications in the future. With this, the maintenance services for XTREME EUV light sources that were provided for ASML Netherlands B.V., a subsidiary of Netherland-based ASML Holding N.V., are transferred to ASML on May 9, local time. The impact of this decision on our financial results has been already reflected in the final results for the term ended in March 2013. About USHIO INC. Established in 1964, USHIO INC. (TOKYO: 6925) is a leading manufacturer of light sources such as lamps, lasers, and LED in a broad range from ultraviolet rays to visible to infrared rays, and optical equipment and cinema-related products incorporating these. It also makes products in the electronics field such as semiconductors, flat panel displays and electronic components, as well as in the visual imaging field including digital projectors and lighting, and these products enjoy dominant market shares. In recent years, it has undertaken business in the life science area such as medicine and the environment. Contact: USHIO INC. Chie Kobayashi, +81-3-3242-1815 IR & Public relations Fax: +81-3-3245-0589 firstname.lastname@example.org http://www.ushio.co.jp/en/ 2-6-1 Otemachi, Chiyoda-ku, Tokyo
USHIO to Consolidate EUV Business into a Single Unit in Japan and Continue Its Business for Inspection and Development
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