Axcelis 'Purion M' Medium Current Implanter Selected By Leading Foundry For Advanced Logic Device Manufacturing

 Axcelis 'Purion M' Medium Current Implanter Selected By Leading Foundry For
                     Advanced Logic Device Manufacturing

System Delivers Industry Leading Purity, Precision and Productivity for the
Sub 2Xnm Era

PR Newswire

BEVERLY, Mass., April 17, 2013

BEVERLY, Mass., April 17, 2013 /PRNewswire/ --Axcelis Technologies, Inc.
(Nasdaq: ACLS), a leading supplier of innovative, high-productivity solutions
for the semiconductor industry, announced today that one of the world's
leading foundries has chosen theCompany's innovative Purion M^™ medium
current implanterfor their most advanced semiconductor manufacturing
facility. The system will be used to design and manufacture next generation
devices for the sub 2Xnm node.

Bill Bintz, executive vice president of product development, engineering and
marketing commented, "We're very excited about this new placement and growing
our installed base as they expand their operations. The Purion M addresses
some of the toughest challenges facing chip manufacturers as they move deeper
into the nanotechnology era. Absolute implant precision and beam purity are
paramount in achieving the process technology requirements and yield goals for
sub 2X processes. The Purion M, the industry's newest and most advanced
medium current implanter is the only tool that meets those goals, while also
achieving unmatched levels of manufacturing flexibility and capital
efficiency, making it the implanter of choice for a high volume, leading edge
foundry."

The Purion M
The new Purion M medium current system utilizes Axcelis' advanced spot beam
line technology coupled with the Purion 500 WPH single wafer platform. This
combination provides chip manufacturers with exceptional reliability, and
remarkable precision and productivity for the widest range of implant energies
and doses to address applications that include the formation of precise wells,
channels and source/drain junctions. In addition, the system's
industry-leading energy range and beam currents enable it to be utilized for
implant processes traditionally run on high energy or high current implanters,
providing chipmakers with maximum manufacturing versatility and capital
efficiency. The Purion M's beam line design utilizes Axcelis' patented angular
energy filter and angle control system, eliminating all forms of energy
contamination while ensuring the industry's most accurate dopant placement.
The result is an exceptionally pure and precise implant, enabling the highest
production yields.

About Axcelis:
Axcelis (Nasdaq: ACLS), headquartered in Beverly, Mass., has been providing
innovative, high-productivity solutions for the semiconductor industry for
over 35 years. Axcelis is dedicated to developing enabling process
applications through the design, manufacture and complete life cycle support
of ion implantation systems, one of the most critical and enabling steps in
the IC manufacturing process. The Company's Internet address is:
www.axcelis.com.

CONTACTS:

Maureen Hart (editorial/media) 978.787.4266
maureen.hart@axcelis.com

Jay Zager (financial community) 978.787.9408
jay.zager@axcelis.com

SOURCE Axcelis Technologies, Inc.

Website: http://www.axcelis.com
 
Press spacebar to pause and continue. Press esc to stop.