Bruker Introduces New AFM Semiconductor Characterization Solution

  Bruker Introduces New AFM Semiconductor Characterization Solution

      Highest Resolution Carrier Profiling Capability Confirmed by Imec

Business Wire

SANTA BARBARA, Calif. -- April 4, 2013

Bruker announced today the release of the Dimension Icon® SSRM-HR, a new
atomic force microscope (AFM) configuration including the Scanning Spreading
Resistance Microscopy (SSRM) module, designed specifically for high-resolution
(HR) semiconductor characterization. Integrating Bruker’s industry-leading
Dimension Icon AFM platform with an environmental control system capable of
1ppm gas purity and high-vacuum control, the Dimension Icon SSRM-HR system
provides vastly improved repeatability and spatial resolution in semiconductor
carrier profiling. As confirmed by Imec (www.imec.be), buried gate oxide
layers as thin as 5Å are detected routinely.

Dimension Icon SSRM-HR (Photo: Business Wire)

Dimension Icon SSRM-HR (Photo: Business Wire)

“As our customers continue to improve their products to follow the
semiconductor roadmap, higher spatial resolution electrical characterization
is a key requirement,” said David V. Rossi, Executive Vice President and
General Manager of Bruker's AFM Business. “The new Dimension Icon SSRM-HR
combines the leading productivity and large programmable stage of our top
performance AFM platform with atomic resolution, and the most accurate carrier
profiling optimization to meet the specific demands of next-generation
technology nodes.”

“We chose Bruker because they offer the only solution that meets our needs,”
added Prof. Vandervorst, Imec Fellow and Department Head, Materials and
Components Analysis, based in Leuven, Belgium. “Our decision followed a
rigorous evaluation of spatial resolution and repeatability in carrier
profiling. Being at the forefront in tackling the roadblocks to continued
technology scaling means we have the most stringent requirements.”

About Dimension Icon SSRM-HR

Dimension Icon SSRM-HR constitutes a new AFM configuration that integrates the
large stage, low drift, and finest force control of the Dimension Icon
platform with the Scanning Spreading Resistance Microscopy (SSRM) application
module, SSRM-DIA probes, and high-end environmental control. Following
seamless sample transfer from a high vacuum sample preparation chamber, oxygen
and water are controlled at the 1ppm level during AFM imaging. The
environmental control system is compatible with all released Dimension Icon
accessories and application modules, further extending its benefits to
additional applications.

About Bruker Corporation

Bruker Corporation (NASDAQ: BRKR) is a leading provider of high-performance
scientific instruments and solutions for molecular and materials research, as
well as for industrial, diagnostics and applied analysis. For more information
about Bruker Corporation, please visit www.bruker.com.

About Imec

Imec performs world-leading research in nanoelectronics. Imec leverages its
scientific knowledge with the innovative power of its global partnerships in
ICT, healthcare and energy. Imec delivers industry-relevant technology
solutions. Imec is headquartered in Leuven, Belgium, and has offices in
Belgium, the Netherlands, Taiwan, US, China, India and Japan. Further
information on Imec can be found at www.imec.be.

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Contact:

Bruker Nano Surfaces Division
Stephen Hopkins, +1-520-741-1044 x1022
Marketing Communications
steve.hopkins@bruker-nano.com