OKI Delivers Exhaust Gas Treatment Equipment for ON Semiconductor's European plants

  OKI Delivers Exhaust Gas Treatment Equipment for ON Semiconductor's European
  plants

    - Ensures exhaust gas processing in atmospheric pressure CVD thin film
    manufacturing processes and film manufacturing consistency to maintain
                     customer's production environment -

Business Wire

TOKYO -- March 11, 2013

OKI Engineering, provider of reliability evaluations and environmental
conservation technologies for the OKI Group, recently delivered KGT-3MM-AP
exhaust gas treatment equipment for atmospheric pressure CVD ^ manufacturing
equipment to semiconductor manufacturer ON Semiconductor's European plants.
The exhaust gas treatment equipment remove the special material gases used
with atmospheric pressure CVD manufacturing equipment while controlling and
maintaining constant exhaust pressure. Thus, it ensures reliability and
consistency in the CVD thin film manufacturing line, ultimately helping to
maintain the customer's production environment. 

In the manufacture of semiconductors such as Power FET and IGBT atmospheric
pressure CVD manufacturing equipment is vital at the stage of insulating film
manufacture. However, this equipment uses harmful gases such as silane (SiH4),
^ phosphine (PH3), and diborane (B2H6) and requires exhaust gas processing.
OKI Engineering's KGT-3MM-AP exhaust gas treatment equipment is a wet-type
processor that effectively processes the special material gases and
particulate matter used in CVD thin film manufacture. The treatment equipment
contains a special stainless steel filter to improve scrubbing efficiency. The
design minimizes filter clogging for extended maintenance-free use. A unique
design intended to facilitate cleaning of the internal filter has won praise
for ease of maintenance. The micromanometer used for pressure control was
designed specifically for CVD gas use. Inverter control for the exhaust fan
ensures the constant exhaust pressure essential for atmospheric pressure CVD
thin film manufacture and extended operational reliability and consistency.

"Three years previously, OKI Engineering delivered the KGT-3MM-AP to ON
Semiconductor as an exhaust gas processor for Amaya continuous atmospheric
pressure CVD manufacturing equipment," says Yutaka Asai, President of OKI
Engineering. "This latest order for ON Semiconductor's European plants was
prompted by ON semiconductor's satisfaction with the processor's pressure
control configuration and exhaust gas scrubbing efficiency and by the benefits
of consistent, trouble-free CVD thin film manufacture. Introduction of the
treatment equipment ensures consistent film thickness distributions for CVD
thin films, including NSG, PSG, and BPSG, at ON Semiconductor's European
plants. It also increases factory throughput while cutting exhaust gas
processing costs."

OKI Engineering began manufacturing exhaust gas treatment equipment
approximately 30 years ago. Since then, it has supplied treatment equipments
to numerous semiconductor and solar cell mass production plants in Japan and
Taiwan. This latest order expands its reach into Europe. OKI Engineering also
plans to expand into new regions including Southeast Asia.

About OKI Electric Industry (OKI)

Founded in 1881, OKI Electric Industry is Japan's leading telecommunications
manufacturer in the Info-telecom field. Headquartered in Tokyo, Japan, OKI
provides top-quality products, technologies, and solutions to customers
through its info-telecom systems and printer operations. Its various business
divisions function synergistically to bring to market exciting new products
and technologies that meet a wide range of customer needs in various sectors.
Visit OKI's global website at http://www.oki.com/.

Notes:

  *The names of the companies and products mentioned in this document are the
    trademarks or registered trademarks of the respective companies and
    organizations.

Contact:

OKI Electric Industry
Sonomi Kitamura, +81-3-3501-3835
Public Relations Division
press@oki.com