Axcelis 'Purion M' Medium Current Implanter Selected By Leading Chipmaker For
Memory And Flash Device Manufacturing
System Delivers Industry Leading Purity, Precision and Productivity for the
Sub 2Xnm Era
BEVERLY, Mass., March 6, 2013
BEVERLY, Mass., March 6, 2013 /PRNewswire/ --Axcelis Technologies, Inc.
(Nasdaq: ACLS), a leading supplier of innovative, high-productivity solutions
for the semiconductor industry, announced today the Company's innovative
Purion M^TM medium current implanter has been selected by another one of the
world's leading chipmakers. The system will be used to develop and manufacture
next generation memory and FLASH devices.
Bill Bintz, executive vice president of product development, engineering and
marketing commented, "We're very excited about this new win and the growth
opportunities the system provides Axcelis." He continued, "The Purion M was
selected after an extensive evaluation focused on implant accuracy,
repeatability, and purity; key requirements to achieve the customer's most
challenging demands for emerging new device architectures. The system's
innovative angle control system provides significant advantages over the
competition in this critical area. In addition, the Purion M effectively
demonstrated its ability to maintain the industry's highest levels of
productivity, beyond the traditional operating range for medium current
implanters, resulting in unmatched levels of manufacturing flexibility and
capital efficiency, significantly reducing their implant bay operating costs."
The Purion M
The new Purion M medium current system utilizes Axcelis' advanced spot beam
line technology coupled with a 500 WPH single wafer platform. This
combination provides chip manufacturers with exceptional reliability, and
remarkable precision and productivity for the widest range of implant energies
and doses to address applications that include the formation of precise wells,
channels and source/drain junctions. In addition, the system's
industry-leading energy range and beam currents enable it to be utilized for
implant processes traditionally run on high energy or high current implanters,
providing chipmakers with maximum manufacturing versatility and capital
efficiency. The Purion M's beam line design utilizes Axcelis' patented angular
energy filter and angle control system, eliminating all forms of energy
contamination while ensuring the industry's most accurate dopant placement.
The result is an exceptionally pure and precise implant, enabling the highest
Axcelis (Nasdaq: ACLS), headquartered in Beverly, Mass., provides innovative,
high-productivity solutions for the semiconductor industry. Axcelis is
dedicated to developing enabling process applications through the design,
manufacture and complete life cycle support of ion implantation systems, one
of the most critical and enabling steps in the IC manufacturing process. The
Company's Internet address is: www.axcelis.com.
Maureen Hart (editorial/media) 978.787.4266
Jay Zager (financial community) 978.787.9408
SOURCE Axcelis Technologies, Inc.
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