Pall Corp. and Lewis University Expand Research on Interaction between Nanoparticles and Filter Media

  Pall Corp. and Lewis University Expand Research on Interaction between
  Nanoparticles and Filter Media

  Insights Presented at International Forum Can Help in the Development and
      Selection of New Chemical Mechanical Polishing Filtration Products

Business Wire

PORT WASHINGTON, N.Y. -- March 5, 2013

Building on earlier teamwork with Lewis University, Pall Corporation
(NYSE:PLL) today announced that scientists from both organizations have
expanded research into optimizing filtration technology for chemical
mechanical planarization (CMP) operations, a critical step in the manufacture
of microchips. With the advent of new slurries containing ever finer
nanoparticles, filtration is critical to removing oversized, defect-causing
particles while allowing the unhindered passage of the active, small
particles. The study was designed to elucidate differences in adsorption
characteristics of silica and ceria particles, which are common abrasives in
CMP slurry, to filter media. The results can provide guidance when designing
filtration for specific slurry types, or when recommending specific filter
grades or modes of usage in order to maximize filtration efficiency and
service life.

A paper on the Pall/Lewis University research, “The Role of Abrasive Type and
Media Surface Energy on Nanoparticle Absorption,” was recently presented by
Vivien Krygier, Ph.D., senior vice president of Pall Microelectronics
marketing, at the International Conference on Planarization/CMP Technology
(ICPT) in Grenoble, France. The conference is an international forum for
academic researchers, industrial practitioners and engineers from around the
world to share research in CMP technology.

For the second year in a row, Lewis University undergraduate student Jordan
Kaiser and Jason Keleher, Ph.D., assistant professor of Chemistry, have
collaborated with Patrick Levy, product manager at Pall Corp., and Patrick
Connor, Ph.D., associate director at Pall Corp., on nanoparticle/filtration
research. The research focused on gaining mechanistic insight centered on the
synergy between nanoparticles and filtration media exhibiting modulated
surface energy. Results revealed a significant difference in particle/filter
media interaction occurring under conditions that simulate actual capture of
abrasive particles or their agglomerates in a depth filter.

Pall Microelectronics supports customers in the semiconductor, data storage,
fiber optic, display, and solar energy materials industries with innovative
detection, filtration, and purification products, and deep applications
expertise, for chemical, gas, water, chemical mechanical polishing (CMP) and
photolithography processes.

To learn more about Pall’s solutions for semiconductor manufacturers, please
visit:
http://www.pall.com/main/Microelectronics/Chemical-Mechanical-Polishing-Filtration-54166.page.

About Pall Corporation

Pall Corporation (NYSE:PLL) is a filtration, separation and purification
leader providing solutions to meet the critical fluid management needs of
customers across the broad spectrum of life sciences and industry. Pall works
with customers to advance health, safety and environmentally responsible
technologies. The company’s engineered products enable process and product
innovation and minimize emissions and waste. Pall Corporation is an S&P 500
company serving customers worldwide. Pall has been named a “top green company”
by Newsweek magazine. To see how Pall is helping enable a greener, safer, more
sustainable future, follow us on Twitter @PallCorporation or visit
www.pall.com/green.

Lewis University is a Catholic university offering distinctive undergraduate
and graduate programs to more than 6,500 traditional and adult students. Lewis
offers multiple campus locations, online degree programs, and a variety of
formats that provide accessibility and convenience to a growing student
population. Sponsored by the De La Salle Christian Brothers, Lewis prepares
intellectually engaged, ethically grounded, globally connected, and socially
responsible graduates. The seventh largest private not-for-profit university
in Illinois, Lewis has been nationally recognized by The Princeton Review and
U.S. News & World Report. Visit www.lewisu.edu  for further information.

Contact:

Pall Corporation
Marie (MacLean) Baron
Director, Pall Industrial Global Marketing Communications
516-801-9282
Mobile: 516-492-1462
Marie_Baron@pall.com
or
Lewis University
Kathrynne Skonicki
Director of Media Relations
815-536-5711
Mobile: 815-210-6305
skonicka@lewisu.edu
 
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