Dai Nippon Printing and Luminescent Technologies Achieve Milestone in Joint Development Program for Computational Metrology and

 Dai Nippon Printing and Luminescent Technologies Achieve Milestone in Joint
        Development Program for Computational Metrology and Inspection

PR Newswire

PALO ALTO, Calif., Feb. 25, 2013

PALO ALTO, Calif., Feb. 25, 2013 /PRNewswire/ -- Luminescent Technologies Inc.
(Luminescent), the leading provider of Computational Metrology and Inspection
solutions for the global semiconductor manufacturing industry and Dai Nippon
Printing Company, Ltd. (DNP) announced today the successful completion of the
first phase of a three (3)-year joint development program for computational
metrology and inspection using Luminescent's Automated Image Processing Hub
(LAIPH) platform. The goals of the collaboration are to dramatically reduce
photomask defect review and analysis cycle time while simultaneously improving
overall mask quality. The first phase resulted in the successful
implementation of LAIPH Aerial Image Analyzer (AIA) software in DNP's
Kami-Fukuoka photomask production plant.

"Today's advanced design technologies for semiconductors require sophisticated
software to enable quick and accurate disposition of reticle defects for
state-of-the-art lithography tools," said Mr. Hideyoshi Takamizawa, Deputy
General Manager, Photomask Technical Department, 1^st Production Division,
Fine Electronics Business Operations  of DNP. "We are impressed with results
obtained from Luminescent's AIA software and look forward to extending the use
of the LAIPH platform for further applications."

"We are proud DNP has chosen Luminescent to assist with their world class
performance in mask cycle time and quality," added Dr. Linyong (Leo) Pang, Sr.
Vice President of Luminescent. "Our contribution to DNP's manufacturing
success is further proof of the power of computational methods in defect
metrology and inspection."

Aerial Image Analyzer (AIA) is one of the applications on Luminescent's LAIPH
platform to address the growing challenges of inspection in advanced mask
shops and wafer fabs. It provides precise quantitative analysis of defect
images captured by Carl Zeiss SMT's Aerial Image Measurement System (AIMS^TM)
and Applied Materials Aera^TM series mask inspection systems. AIA
automatically dispositions the defect based on its simulated wafer contour,
CD, and location. It improves the equipment's utilization while offering 100X
faster, more comprehensive and consistent analysis than operator's manual
measurements.

About Luminescent Technologies, Inc.
Luminescent is a privately-held, venture-backed company headquartered in Palo
Alto, California. Luminescent is a pioneer and leader in computational methods
that improve yield and reduce costs in mask and wafer manufacturing. To learn
more about Luminescent, please visit the company's website at
www.luminescent.com.

About DNP
DNP Fine Electronics Business Operations (a division of Dai Nippon Printing
Co., Ltd.) is the premier technology leader in photomask innovation. DNP
partners with technology leaders across the world providing superior quality
photomasks and R&D support to symbiotically stay ahead of the technical race.
For more information visit http://www.dnp.co.jp/eng/.

AIMS and Aera are trademarks of Carl Zeiss and Applied Materials,
respectively.

SOURCE Luminescent Technologies, Inc.

Website: http://www.luminescent.com
Website: http://www.dnp.co.jp/eng
Contact: Luminescent Technologies, Inc., Linyong (Leo) Pang, +1-650-433-1025,
info@luminescent.com; or DNP, Hideyoshi Takamizawa,
takamizawa_h@mail.micro.dnp.co.jp
 
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