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Nikon Announces New Immersion Scanner for the Most Demanding Multiple Patterning Applications



  Nikon Announces New Immersion Scanner for the Most Demanding Multiple
  Patterning Applications

Business Wire

TOKYO -- February 20, 2013

Nikon Corporation has announced release of the NSR-S622D ArF immersion scanner
to deliver world-class overlay and ultra-high productivity for the most
demanding multiple patterning applications. The S622D is the latest evolution
of the Streamlign Platform, which is already employed globally for
NSR-S620/S621D immersion scanners, and in the leading-edge NSR-S320F dry ArF
scanner. The proven Bird’s Eye control system is combined with enhancements to
scanner autofocus and lens performance to enable mix-and-match overlay (MMO)
accuracy ≤ 3.5 nm in order to satisfy the most challenging immersion multiple
patterning requirements. In addition, the established Stream Alignment and
Five-Eye FIA systems enable ultra-high throughput of 200 wafers per hour (125
exposure shots/wafer) to maximize scanner productivity.

The semiconductor industry is transitioning to development and high volume
manufacturing of sub-20 nm generation process devices, with the most critical
layers exposed using ArF immersion scanners and incorporating multiple
patterning. In order to minimize costs for IC makers, exceptional scanner
overlay matching capabilities are vital to ensuring high yield and optimal
productivity. The S622D builds upon the well-known Streamlign Platform,
incorporating further projection lens and autofocus system developments to
deliver world-class mix-and-match overlay and ultra-high throughput. The
NSR-S622D is the most advanced scanner for high volume immersion applications,
and fully satisfies aggressive sub-20 nm multiple patterning requirements.

With a consistent focus on technology solutions to enable next generation
lithography, Nikon continues to introduce new scanners to market that satisfy
device makers’ increasingly challenging performance and productivity
requirements. “Nikon Streamlign platform-based immersion and dry ArF scanners
have gained strong worldwide market acceptance. The NSR-S622D is the latest
evolution of this proven technology, and delivers unprecedented overlay
performance and ultra-high throughput, which are essential for cost-effective,
leading-edge multiple patterning applications,” stated Hamid Zarringhalam,
Executive Vice President of Nikon Precision Inc.

About Nikon

Since 1980, Nikon Corporation has been revolutionizing lithography with
innovative products and technologies. The company is a worldwide leader in
lithography equipment for the microelectronics manufacturing industry with
more than 8,000 exposure systems installed worldwide. Nikon offers the most
extensive selection of production-class steppers and scanners in the industry.
These products serve the semiconductor, flat panel display (LCD) and thin-film
magnetic head (TFH) industries. Nikon Precision Inc. provides service,
training, applications and technical support, as well as sales and marketing
for Nikon lithography equipment in North America. For more information about
Nikon, access our website at http://www.nikonprecision.com.

This press release contains forward-looking statements as that term is defined
in the Private Securities Reform Act of 1995, which are subject to known and
unknown risks and uncertainties that could cause actual results to differ
materially from those expressed or implied by such statements. Such statements
are subject to risks, uncertainties and changes in condition, particularly
those related to industry requirements and other risks. The Company undertakes
no obligation to update the information in this press release.

Contact:

Nikon Precision Inc.
Holly Magoon, 802-879-5027
Senior Marketing Manager
holly.magoon@nikon.com
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