Mentor Graphics Announces Comprehensive Design Enablement Platform for Samsung’s 14nm IC Manufacturing Process

  Mentor Graphics Announces Comprehensive Design Enablement Platform for
  Samsung’s 14nm IC Manufacturing Process

Business Wire

WILSONVILLE, Ore. -- December 21, 2012

Mentor Graphics Corp. (NASDAQ: MENT) today announced comprehensive design,
manufacturing, and post tapeout enabling support for Samsung’s 14nm IC
manufacturing processes, providing customers with a complete design-to-silicon
flow concurrent with early process availability. The fully interoperable
Mentor® flow helps customers achieve fast design cycles and first time silicon
success.

The Mentor solutions optimized for Samsung’s 14nm offerings include the
Calibre® platform with design rule checking (DRC), LVS checking, extraction,
design for manufacturing (DFM) and advanced fill, as well as the Tessent®
design for test (DFT) suite and yield analysis tools.

“Samsung and Mentor have been working together to speed the enablement of
design and manufacturing co-optimization for many years, and our collaboration
is more important than ever at the 14nm node,” said Dr. Kyu-Myung Choi, senior
vice president of System LSI infrastructure design center, Device Solutions,
Samsung Electronics. “The design rules for 14nm are extremely complex with the
introduction of FinFETs in addition to double patterning (DP) layers. It is
critical that physical design, verification and testing tools are intimately
aligned with the manufacturing processes of the target foundry. Since Samsung
also uses the Mentor Calibre solution for its own IC development, designers
using it will get accurate and immediate feedback so they can co-optimize the
design process.”

The Calibre platform creates decomposed double patterning (DP) layouts that
are compliant with all of Samsung’s 14nm lithography requirements and tuned to
the Samsung mask synthesis and OPC process, which is also provided by Mentor
at 14nm. It also provides designers with rapid feedback on complex design
rules for FinFETs, and specific coaching on elimination of DFM litho errors to
make fixing violations faster and more accurate. Calibre tools for LVS and
extraction have been calibrated to ensure accurate device and parasitic models
for Samsung FinFETs, eliminating “double-counting” of important effects that
can occur with other tools. Moreover, Calibre SmartFill ensures there are no
CMP issues with designs by intelligently placing fill structures to achieve
planarity while minimizing timing issues.

Collaboration on Tessent cell-aware test tools is providing higher test
quality for new cell internal structures at 14nm, and higher test pattern
compression to control the cost of testing larger 14nm designs. Mentor and
Samsung are also leveraging production test diagnosis by exchanging
information between the Tessent tools and the Calibre Pattern Matching
facility to quickly identify and eliminate design-specific yield limiting
features during design ramp up.

“Through our close cooperation, Mentor and Samsung are able to provide all the
necessary enabling technology for our customers concurrent with the
availability of Samsung’s 14nm manufacturing processes,” said Joseph Sawicki,
vice president and general manager of the Design to Silicon division at Mentor
Graphics. “This level of collaboration is absolutely necessary to deliver a
14nm-ready design ecosystem.”

About Mentor Graphics

Mentor Graphics Corporation is a world leader in electronic hardware and
software design solutions, providing products, consulting services and
award-winning support for the world’s most successful electronic,
semiconductor and systems companies. Established in 1981, the company reported
revenues in the last fiscal year of about $1,015 million. Corporate
headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon
97070-7777. World Wide Web site: http://www.mentor.com.

(Mentor Graphics, Mentor, Calibre and Tessent are registered trademarks of
Mentor Graphics Corporation. All other company or product names are the
registered trademarks or trademarks of their respective owners.)

Contact:

Mentor Graphics
Gene Forte, 503-685-1193
gene_forte@mentor.com
or
Sonia Harrison, 503-685-1165
sonia_harrison@mentor.com
 
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