Advantest Introduces New Wafer MVM-SEM Tool E3310

  Advantest Introduces New Wafer MVM-SEM Tool E3310

                       Supports Next-Generation Devices

SEMICON Japan 2012 Booth 3D-803 in Hall 3

Business Wire

TOKYO -- November 14, 2012

Leading measurement instrument supplier Advantest Corporation (TSE: 6857,
NYSE: ATE) has introduced its new Multi-Vision Metrology Scanning Electron
Microscope, the Wafer MVM-SEM E3310, which measures fine-pitch patterns on a
wide range of wafer types with unparalleled accuracy, utilizing Advantest’s
proprietary electron beam scanning technology.

WAFER MVM-SEM E3310 (Photo: Business Wire)

WAFER MVM-SEM E3310 (Photo: Business Wire)

Built on advances in the technology used in Advantest’s E3630 MVM-SEM for
photomasks, the E3310 achieves superior capabilities for scanning and
measurement of wafers for next-generation devices. It is a stable,
high-accuracy measurement solution for process development at the 1Xnm node
and mass production at the 22nm node and beyond, contributing to reduced
process TAT (turn around time) and higher productivity. The E3310 will be
featured in Advantest’s exhibit (booth #3D-803 in Hall 3) at the SEMICON Japan
trade show, December 5-7 in Makuhari Messe in the Chiba prefecture.

A Next-Generation 3D Measurement Solution

While advances in semiconductor technology have historically followed Moore’s
Law, technical challenges have recently imperiled the transition to
yet-smaller processes. The development of 3D transistor technologies such as
FINFET (fin-based field effect transistors) is expected to bridge the gap to
mass production at the 22nm node and subsequently the 1Xnm node. Advantest’s
new E3310 provides a stable, highly accurate 3D measurement solution suitable
for these next-generation needs.

Product Features

3D Measurement

The E3310’s multi-detector configuration allows it to achieve stable, highly
accurate measurements at the 1Xnm node. It also features a proprietary
detection algorithm, enabling measurement of the 3D FinFET architectures that
are in the process of full-scale adoption by the semiconductor industry.

Highly Stable, Fully Automatic Image Capture

The E3310 performs stable, fully automatic measurements even at high SEM
magnification, thanks to its high-accuracy stage, charge control function, and
contamination reduction technology.

Support for Diverse Wafer Types

Not only silicon wafers, but AlTiC, quartz, and silicon carbide wafers, among
others, are supported in sizes from 150mm to 300mm, depends on type.

About Advantest Corporation

A world-class technology company, Advantest is the leading producer of
automatic test equipment (ATE) for the semiconductor industry and a premier
manufacturer of measuring instruments used in the design and production of
electronic instruments and systems. Its leading-edge systems and products are
integrated into the most advanced semiconductor production lines in the world.
The company also focuses on R&D for emerging markets that benefit from
advancements in nanotech and terahertz technologies, and has recently
introduced multi-vision metrology scanning electron microscopes essential to
photomask manufacturing, as well as a groundbreaking 3D imaging and analysis
tool. Founded in Tokyo in 1954, Advantest established its first subsidiary in
1982, in the USA, and now has subsidiaries worldwide. More information is
available at www.advantest.com.

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Contact:

Advantest Corporation
Koji Ogiso, 03-3214-7500
PR/IR Section
or
Further Inquiries
Nanotechnology Business Group
info_nano@ml.advantest.com