Advantest Develops Mask Defect Review SEM E5610 For Next-Generation Photomasks

  Advantest Develops Mask Defect Review SEM E5610 For Next-Generation
  Photomasks

SEMICON Japan 2012 Booth #3D-803 in Hall 3

Business Wire

TOKYO -- November 14, 2012

Advantest Corporation (TSE: 6857)(NYSE: ATE) today announced that it has
developed a new mask defect review tool, the Mask DR-SEM E5610, for reviewing
and classifying ultra-small defects in photomask blanks.

MASK DR-SEM E5610 (Photo: Business Wire)

MASK DR-SEM E5610 (Photo: Business Wire)

The E5610 inherits the highly stable, fully automatic image capture technology
developed by Advantest for its acclaimed multi vision metrology SEM for
photomasks, and features a newly developed beam tilt mechanism that enables
scanning at oblique angles. With its high-accuracy, high-throughput defect
review capability, the E5610 is expected to contribute to next-generation
photomask product quality improvement and shorter manufacturing TAT
(turn-around times).

The E5610 will be featured in Advantest’s exhibit (booth #3D-803 in Hall 3) at
the SEMICON Japan trade show, December 5-7 in Makuhari Messe in the Chiba
prefecture.

A Next-Generation Photomask Manufacturing Solution

Photomask manufacturing processes require 100% eradication of fatal defects,
which adversely affect yield, in tandem with TAT reduction. Advantest’s new
E5610 promises to be an indispensable solution for mask manufacturers,
satisfying both of these requirements with fast, accurate technology that
classifies defects and diagnoses appropriate repair solutions with regard to
type.

Product Features

High Spatial Resolution & Oblique Scanning Capability

Advantest’s proprietary column architecture delivers spatial resolution down
to 2nm, even at the low acceleration voltages appropriate for photomask
screening. Moreover, the E5610 features a unique, electrically controlled tilt
module that allows its beam to tilt by up to 15°, enabling users to perform 3D
defect reviews.

Highly Stable, Fully Automatic Image Capture

Even when operating at high SEM magnification, the E5610 performs stable,
fully automatic defect imaging at a high rate of throughput, thanks to its
high-accuracy stage, charge control function, and contamination reduction
technology.

Compatible With Mask Inspection Systems

The E5610 is compatible with mainstream mask inspection systems: the tool
imports defect location data and automatically images the locations. It
supports the industry standard KLARF (KLA Results File) format.

Elemental Composition Analysis Option

The E5610 features an optional EDS (energy dispersive X-ray spectrometry)
module that performs elemental analysis—an advanced method of mapping mask
blank defects.

About Advantest Corporation

A world-class technology company, Advantest is the leading producer of
automatic test equipment (ATE) for the semiconductor industry and a premier
manufacturer of measuring instruments used in the design and production of
electronic instruments and systems. Its leading-edge systems and products are
integrated into the most advanced semiconductor production lines in the world.
The company also focuses on R&D for emerging markets that benefit from
advancements in nanotech and terahertz technologies, and has recently
introduced multi-vision metrology scanning electron microscopes essential to
photomask manufacturing, as well as a groundbreaking 3D imaging and analysis
tool. Founded in Tokyo in 1954, Advantest established its first subsidiary in
1982, in the USA, and now has subsidiaries worldwide. More information is
available at www.advantest.com.

All information supplied in this release is correct at the time of
publication, but may be subject to change.

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Contact:

Advantest Corporation
Koji Ogiso, 03-3214-7500
PR/IR Section
or
Further Inquiries
Nanotechnology Business Group
info_nano@ml.advantest.com